The Division of Nanomaterials Imaging Research conducts research in collaboration with Hitachi High-Tech Corporation with the aim of developing next-generation inspection technologies. Centered on a laser-excited photoemission electron microscope (Laser-PEEM) with the best spatial resolution of 2.6 nm, the division seeks to realize practical implementation of　semiconductor inspection systems that exploit Laser-PEEM’s capability for chemical-state imaging at the nanoscale. Through this effort, it aims to establish "the third type of electron microscopy,” complementing scanning electron microscopy (SEM) and transmission electron microscopy (TEM). To achieve this goal, the division pursues fundamental research on physics of very low energy electron excitation and photoemission in materials while also addressing unresolved phenomena in advanced electronic devices and semiconductor manufacturing processes, and conducting application-oriented studies that leverage the unique properties of Laser-PEEM across a wide range of fields, including superconductors, liquids/solution, biological systems, and energy-related materials.