Directed self-assembly (DSA) of block copolymers (BCP) is one of the most promising methodology to enable the continued miniaturization of microelectronic components and data storage devices, and thus to boost the performance in”More Moore”technologies.The BCP,that self-assemble into periodic structures at the nanometer scale with various morphologies, are promising materials to complement/replace current photolithography and patterning methodologies which approach the physical limits for next generation futures in microelectronic components and storage devices respectively. We will report on templated semicrystalline poly(1,1-dimethyl silacyclobutane)-block- poly(methyl methacrylate) (PDMSB-b-PMMA) thin films enabling the production of highly- ordered patterns with sub-10 nm features. These periodic structures consist of easily etchable PMMA domains separated by carbosilane-based chains which could be transformed into hard mask of SiC.