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https://hasegawa.issp.u-tokyo.ac.jp/nanosci-seminar-240115

The ongoing miniaturization in technological devices and the progress in surface science demand novel instrumental methods for surface characterization on a length scale of only a few atomic distances. The combination of an x-ray photoelectron emission microscope (XPEEM) or low-energy electron microscope (LEEM) is a powerful technique for studying the dynamic and static properties of 2D materials surfaces and thin films including growth and decay, phase transitions, reactions, surface structure and morphology. It utilizes low energy electrons to image surfaces with few nm lateral resolution and atomic layer depth resolution. In the LEEM/XPEEM setup, when using the electron irradiation, the backscattered electrons, Auger and secondary electrons may be used, while photoelectrons, Auger and secondary electrons are utilized for imaging when sample is irradiated with photons. In this talk I will present examples of the application of the LEEM/XPEEM technique to the investigations of novel materials, including 2D layered materials, thin films, and adsorbate structures. I will also introduce the Center for Functional Nanomaterials (CFN) and National Synchrotron Light Source II (NSLS-II) user facilities at the Brookhaven National Laboratory for fabrication and characterization of 2D materials and beyond.

This research used resources of the Center for Functional Nanomaterials and the National Synchrotron Light Source II, which are U.S. Department of Energy (DOE) Office of Science facilities at Brookhaven National Laboratory, under Contract No. DE-SC0012704.